Let's go inside an Intel 4004 microprocessor to see an individual transistor
Jul 24, 2017 - 0:13
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Phosphorus ions then penetrate thin oxide to create the source and drain
Phosphorus ions then penetrate thin oxide to create the source and drain is an episode from Making an Integrated Circuit by John C. Bean - WeCanFigureThisOut.org. This technology episode is made for listeners who follow...
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Phosphorus ions then penetrate thin oxide to create the source and drain is an episode from Making an Integrated Circuit by John C. Bean - WeCanFigureThisOut.org. This technology episode is made for listeners who follow Making an Integrated...
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Published Jul 24, 2017, 0:12 long, audio available.
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To make this transistor, first oxide then nitride layers are grown
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A shadow mask then exposes a photographic emulsion
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Exposed nitride is then etched away
Jul 24, 2017 - 0:07
Oxygen reacts with the Si to grow more oxide
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By heating in silane, polycrystal Si is then grown
Jul 24, 2017 - 0:04
A stripe is exposed in a second photographic emulsion
Jul 24, 2017 - 0:10
Exposed polycrystal Si is etched away leaving the transistor gate
Jul 24, 2017 - 0:09