To make this transistor, first oxide then nitride layers are grown
Jul 24, 2017 - 0:11
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Let's go inside an Intel 4004 microprocessor to see an individual transistor
Let's go inside an Intel 4004 microprocessor to see an individual transistor - Making an Integrated Circuit
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A shadow mask then exposes a photographic emulsion
Jul 24, 2017 - 0:12
Exposed nitride is then etched away
Jul 24, 2017 - 0:07
Oxygen reacts with the Si to grow more oxide
Jul 24, 2017 - 0:12
By heating in silane, polycrystal Si is then grown
Jul 24, 2017 - 0:04
A stripe is exposed in a second photographic emulsion
Jul 24, 2017 - 0:10
Exposed polycrystal Si is etched away leaving the transistor gate
Jul 24, 2017 - 0:09
Phosphorus ions then penetrate thin oxide to create the source and drain
Jul 24, 2017 - 0:12